Articles citing this paper
Characterization of the Non-uniform Reaction in Chemically Amplified Calix[4]resorcinarene Molecular Resist Thin Films1
Vivek M. Prabhu A F , Shuhui Kang A , R. Joseph Kline A , Dean M. DeLongchamp A , Daniel A. Fischer B , Wen-li Wu A , Sushil K. Satija C , Peter V. Bonnesen D , Jing Sha E and Christopher K. Ober E
+ Author Affiliations
- Author Affiliations
A Polymers Division, National Institute of Standards and Technology, Gaithersburg, MD 20899, USA.
B Ceramics Division, National Institute of Standards and Technology, Gaithersburg, MD 20899, USA.
C Center for Neutron Research, National Institute of Standards and Technology, Gaithersburg, MD 20899, USA.
D Center for Nanophase Materials Sciences, Oak Ridge National Laboratory, Oak Ridge, TN 37831, USA.
E Cornell University, Materials Science and Engineering, Ithaca, NY 14853, USA.
F Corresponding author. Email: vprabhu@nist.gov
Australian Journal of Chemistry 64(8) 1065-1073 https://doi.org/10.1071/CH11242
Submitted: 15 June 2011 Accepted: 19 July 2011 Published: 19 August 2011
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