Deposition Rate Effect of Alq3 Thin Film Growth: A Kinetic Monte Carlo Study

Yih-Jiun Lin; Jian-Chuang Chang; Chin-Kuen Tai; Bo-Cheng Wang; Feng-Yin Li

doi:10.1071/CH08099

RESEARCH ARTICLE

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Deposition Rate Effect of Alq₃ Thin Film Growth: A Kinetic Monte Carlo Study

Yih-Jiun Lin ^A , Jian-Chuang Chang ^B , Chin-Kuen Tai ^A , Bo-Cheng Wang ^A ^D and Feng-Yin Li ^C ^D

+ Author Affiliations

- Author Affiliations

^A Department of Chemistry, Tamkang University, Tamsui, Taipei 25137, Taiwan, Republic of China.

^B Material Research Laboratory, ITRI, Hsinchiu 310, Taiwan, Republic of China.

^C Department of Chemistry, National Chung-Hsing University, Taichung 402, Taiwan, Republic of China.

^D Corresponding authors. Email: bcw@mail.tku.edu.tw (B.-C. Wang); feng64@dragon.nchu.edu.tw (F.-Y. Li)

^E This paper is the winner of the Young Scientist Award at the Asian Chemical Congress in Kuala Lumpur, 2007.

Australian Journal of Chemistry 61(8) 600-609 https://doi.org/10.1071/CH08099
Submitted: 11 March 2008 Accepted: 2 July 2008 Published: 15 August 2008

Abstract

This paper is the winner of the Young Scientist Award at the Asian Chemical Congress in Kuala Lumpur, 2007.

Applying the Kinetic Monte Carlo (KMC) technique, we successfully investigated the effect of deposition rate on the growth pattern of an Alq₃ thin film. In good agreement with experimental results, our simulation results indicate that there exists a transition growth in terms of the deposition rate that corresponds to the transition between the island growth and random deposition growth. In the regions of island growth (where the deposition rate is lower than 1.1 Å s^–1) and random deposition growth (where the deposition rate is higher than 3 Å s^–1), the surface morphology is not suitable for luminant devices because of a high roughness, a larger inner vacancy ratio at higher deposition rate, and low homogeneity at lower deposition rate conditions. Within the transition growth region (deposition rate is between 1.1 and 3.0 Å s^–1), the homogeneity of the film surface improves as the deposition rate increases. Not only does the pattern of the island structures become blurred, but the inner vacancy ratio and surface roughness also remain low as the deposition rate increases. From our results, there may exist a deposition rate to optimize the Alq₃ film with a suitable surface morphology for luminant devices.

References

Deposition Rate Effect of Alq3 Thin Film Growth: A Kinetic Monte Carlo Study

Abstract

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Deposition Rate Effect of Alq₃ Thin Film Growth: A Kinetic Monte Carlo Study